The production
method of fused quartz glass can be: electrically fused, flame
fused, plasma fused and electric-arc fused. The raw material
can be natural quartz sand SiO2 and synthetic chemical-silicon
tetrachloride(SiCl4). The combination of production methods and
raw material composes the main 6 types of our quartz glass: EN
(electrically fused natural quartz) series; FN (flame fused natural
quartz) series; PN (plasma fused natural quartz) series; FS (flame
fused synthetic quartz) series; PS (plasma fused synthetic quartz)
series; AN (electric-arc fused natural quartz) series. Electrically Fused Quartz Glass Electric fusion is the most commonly used melting process for manufacturing
quartz glass. This process uses resistance Heaters to melt natural
quartz sand into quartz glass tube, rod, blocks etc.. There are
two methods of electric fusion, continous fusion and batch fusion.
In the continous process, quartz sand is continuously poured into
the upper part of tungsten crucible surrounded by electric Heaters
elements. The inside crucible is maintained in a neutral or slightly
reduced atmosphere that keeps silica from reacting with the refractory
metal while the silica is melted inside. The melted quartz exits
at the forming part at the bottom of crucible which is shaped into
tube, rod and so on. The OH can be reduced by annealing. In the
batch fusion process, several tons of raw material are placed inside
a refractory vacuum chamber containing graphite Heaters elements
to produce tube, rod and so on. The OH is usually below 2ppm. The
low OH makes electrically fused quartz glass has high infrared
transmission. The electrically fused quartz glass usually has certain
bubble and drawing line on glass surface. Flame Fused Quartz Glass Flame fusion is a 2-step process. The first process is the natural
quartz sand or synthetic SiC14 is melted in hydrogen/oxygen (H2/O2)
flame into a solid round ingot. The second process is to further
shape the ingot into various shape and dimension. Flame fused quartz
glass contains a adundant amount of hydroxyl (OH) as a result of
the direct contact between the H2/O2 and the silica raw material.
This OH content can not be reduced by annealing and its presence
lowers the viscosity and infrared transmission. The flame fused
quartz has no drawing line and very low bubble content. Plasma Fused Quartz Glass Plasma fusion is a 2-step process. The first process is the natural
quartz sand or synthetic SiCl4 is melted in plasma flame into a
solid round ingot. The second process is to further shape the ingot
into various shape and dimension. Plasma fused quartz has low OH
usually below 5ppm, so it has good infrared transmission. The plasma
fused quartz has very low bubble content and has no drawing line.
Electric-arc Fused Opaque Crucible
Electric-arc fusion is the commonly used process for manufacturing
crucible which is used to grow monocrystalline silicon ingot.
QUARTZ GLASS TYPE
type
main application
characteristics
Standard
Quartz
standard quartz
EN07
EN07EB OH ≤5ppm
industrial standard quartz,
used in many industries such as semiconductor, high quality
lamps and other hi-temperature fields
Lamps
Quartz
standard EN07
EN07EB OH ≤5ppm
quality high pressure mercury lamps,
metal halide lamps, medium pressure ozone producing UV lamps
see above
metal halide lamps, xenon flash lamps,
laser flash lamps, medium preEN07SB OH≤1ppmssure ozone producing
UV lamps, sleeve of medium pressure ozone producing UV lamps
Low cost EN09
EN09UB OH≤150ppm
sleeve of low pressure ozone free
UV lamps, thermo-cou ple, low cost halogen bulbs, exhaust tube
of low pressure lamps
electrically
fused clear quartz using slightly lower purity quartz sand
model N09 of SiO2 >99.95% as raw material, it has
good dimensional tolerance, good thermal and mechanical properties,
has certain air line and bubble content, available in tube,
rod and plate
EN09UB OH≤15ppm
halogen bulbs, high pressure mercury
lamps, exhaust tube of medium pressure and high pressure lamps,
laborotary, chemical industries and other fields where purity
is not critical
Low alkaline PN05
PN05 OH≤5ppm
lamps for critical application, for
example UHP-lamps for digital projection
plasma fused clear
quartz using specially purified quartz crystal sand model N05
with SiO2>99.995%
as raw material. The K+Li+Na is reduced to 0.5 ppm. It is drawn
without the use of mandrel and die, has very good homogeneity
and very low bubble content
cerium (Ce) doped
EN09Ce NBOH
≤70ppm
UV stop halogen bulbs, sleeve of
metal halide lamps and HID automobile lamps, low cost UV stop
application
electrically fused cerium doped quartz
is known as UV stop or UV cut quartz, it blocks UV radiation
almost completely and has very high transmission in visible
light region, to dope N09 material and N07 material, we get
EN09Ce and EN07Ce respectively, except its special optical
properties, it has the same properties as its original clear
quartz, available in tube, rod and plate
EN09Ce EB OH
≤20ppm
quality UV stop halogen bulbs
EN07Ce EB OH
≤5ppm
medium pressure, high pressure UV
stop lamps
EN07Ce SB OH
≤lppm
medium pressure, high pressure UV
stop lamps
PN08Ce OH
≤5ppm
quality laser flash
lamps
plasma fused cerium doped quartz glass, is
blocking UV radiation almost completely, it is drawn without
the use of mandrel and die, therefore free from drawing line,
it has very high homogeneity and very low bubble content, available
in tube and plate
titanium (Ti) doped
EN09TiNB OH≤15ppm
Low pressure ozone free UV lamps
electrically fused titanium. doped
quartz is known as ozone free quartz. It has cut off at ozone
producing line of wavelength 220nm. We dope material N09 and
N07 to get doped quartz glass EN09Ti and EN07Ti respectively.
Except its special optical properties, it has the same dimensional,
thermal, mechanical properties as its original clear quartz.
Available in tube, rod, ingot and plate.
EN07TiEB OH≤5ppm
medium pressure, high pressure ozone free UV
lamps such as ozone free reprographic lamps, xenon flash lamps
EN07TiSB OH≤1ppm
quality medium pressure, high pressure ozone
free UV lamps, such as ozone free reprographic lamps, xenon
flash lamps, sleeve of medium pressure UV lamps.
plasma fused titanium doped
quartz glass,has cut off at ozone producing line of wavelength
220 nm,it is drawn without the use of mandrel and die, free
from drawing line, it has high homogeneity and very low bubble
content, avaiable in tube and plate.
Semiconductor & Optical
Quartz
EN07EB
OH≤5ppm
the tube is used in semiconductor diffusion,
oxidation and LPVCD process, the rod is used in silicon wafer
carner, the ingot is used to be made into plate & flange
in semiconductor and optics
see standard quartz
FN08
OH≤175ppm
handle rod & tube of fiber optics, low
cost semiconductor, laboratory quart ware,insulation, aerospace
and so on, can not be used in infrared
flame fused clear quartz glass,
using quartz sand model N08 with SiO2>99.98% as raw material. The
purity of N08 is in the middle of N07&N09. It has
very low bubble and no drawing line. Available in tube, rod,
ingot, plate, wool, yarn, fabrics
PN08
OH≤5ppm
infrared application, handle rod & tube
of fiber optics
plasma fused clear quartz glass,
using quartz sand model N08 with SiO2>99.98% as raw material, has
very low bubble, no drawing line and low OH, available in tube,
rod, ingot and plate.
FS03
OH≤175ppm
critical semiconductor application. optics,
can not be used in infrared.
ultra high purity synthetic flame fused clear
quartz glass. It uses synthetic chemical SiCl4 with
SiO2> 99.9995% as raw material. Has
super high purity and excellent visual of nearly no bubble.
Available in tube, rod, ingot, plate
PS03
OH≤5ppm
critical semiconductor application, infrared
application, optics, deep UV application
ultra high purity synthetic plasma fused clear
quartz glass. It uses synthetic chemical SiCl4 with
SiO2>99.9995% as raw material.
Has super high purity and low OH, excellent visual of nearly
no bubble. Available in tube, rod, ingot, plate
Fiber Optics Quartz
low alkaline PN05
PN05 OH≤5ppm
substrate tube for optical preform
see lamps quartz PN05
Quartz Crucible
for Silicon Growing
AN07 OH≤50ppm
monocrystalline silicon ingot growing used
for solar cell wafer
electric-arc fused quartz crucible, it has
clear inner surface and sandy opaque outer surface, using quartz
sand model N07 of SiO2>99.99% as raw material. Available
in 12", 14", 16" , 18", 20", 22".
